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HOME > 제품소개ComponentsRF ION SOURCE > OIS-Four

OIS-Four

Application

OIS-Four 관련 이미지

OIS-Four is a compact but high performance RF ion sourcespecially designed for IAD coating system and suitable forvacuum coating and substrate cleaning at high rate.The 10cm grid is small, but enables dense, uniform radiationover entire dome of our OTFC-600 and OTFC-900.Most suitable for test coatings of optical filters, medium-sizedproduction and R&D purpose.

FEATURES

  • Long life and less contamination compared with other ionsources using consumables such as filament.
  • High uniformity of ion density distribution, power and boardcoverage of evaporation over 800mm dia.
  • Highly stable and long operation hours.

Specifications

Specifications of OIS - Four
Dimensions φ224mm×143mm(H)
Grids φ 10cm three molybdenum grids
Beam voltage 100V~1500V
Max beam current 500mA(max))
Acc voltage 100V~1000V
Max RF power 600W
Gas flow rate 25sccm~35sccm(oxygen)
10sccm~20sccm(argon)
Pressure 5×10-2Pa
Water-cooling RF coil and main unit
Neutralizer
Dimensions φ6cm×8cm
Max emission current 1500mA
Max RF power 150W
Gas flow rate 5sccm~8sccm(argon only)

OIS-Four 관련 이미지

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