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PRODUCT INTRODUCTION - OPTORUN PRODUCT INTRODUCTION - OPTORUN
PRODUCT INTRODUCTION - OPTORUN

optorun introduction

OTFC-900
Model OTFC-900CBI/DBI
Vacuum Chamber SUS304, φ900mm × 1300mm (H)
Substrate Dome Size φ790mm
Substrate Dome Rotation Speed 10 rpm to 30 rpm (Variable)
Optical Film Thickness Control System HOM2-R-VIS350A High-precision Optical Monitor
· Wavelength range: 350nm to 1100nm
· Reflection/Transmittance
Crystal Film Thickness Monitor XTC/3 plus 6-point rotary sensor
Evaporation Source EB source: 2 units
Ion Source 10cm RF Ion Source
Vacuum System Roughing Pump, Diffusion Pump + Polycold Or Cryo Pump + Cryo Trap
Performace
Ultimate Pressure 7.0 × 10-5Pa or lower
Pump Down Rate 15 min (Atm. to 1.3 × 10-3Pa)
Substrate Heater 350℃ (max.)
Utility
Layout Dimensions 4500mm (W) × 5500mm (D) × 3200mm (H) approx.
Power Requirements 3-phase, 200V, 50/60Hz, 80kVA approx.
Cooling Water Flow Rate 80 /min or greater
Compressed Air Pressure 0.5MPa or greater
Gross Weight 5400kg approx.
OTFC-1300
Model OTFC-1300CBI/DBI
Vacuum Chamber SUS304, φ1300mm × 1610mm (H)
Substrate Dome Size φ1130mm
Substrate Dome Rotation Speed 10 rpm to 50 rpm (Variable)
Optical Film Thickness Control System HOM2-R-VIS350A High-precision Optical Monitor
· Wavelength range: 350nm to 1100nm
· Reflection/Transmittance
Crystal Film Thickness Monitor XTC/3 plus 6-point rotary sensor
Evaporation Source EB source: 2 units
Ion Source 17cm RF Ion Source
Vacuum System Roughing Pump, 2 Diffusion Pumps + Polycold Or 2 Cryo Pumps + Cryo Trap
*Option: Turbomolecular pump selectable
Performace
Ultimate Pressure 7.0 × 10-5Pa or lower
Pump Down Rate 15 min (Atm. to 1.3 × 10-3Pa)
Substrate Heater 350℃ (max.)
Utility
Layout Dimensions 5000mm (W) × 6500mm (D) × 3500mm (H) approx.
Power Requirements 3-phase, 200V, 50/60Hz, 100kVA approx.
Cooling Water Flow Rate 140 /min or greater
Compressed Air Pressure 0.5MPa or greater
Gross Weight 8500kg approx.
OTFC-1550
Model OTFC-1550CBI/DBI
Vacuum Chamber SUS304, φ1550mm × 1800mm (H)
Substrate Dome Size φ1400mm
Substrate Dome Rotation Speed 10 rpm to 30 rpm (Variable)
Optical Film Thickness Control System HOM2-R-VIS350A High-precision Optical Monitor
· Wavelength range: 350nm to 1100nm
· Reflection/Transmittance
Crystal Film Thickness Monitor XTC/3 plus 6-point rotary sensor
Evaporation Source EB source: 2 units
Ion Source 17cm RF Ion Source
Vacuum System Roughing Pump, 2 Diffusion Pumps + Polycold Or 2 Cryo Pumps + Cryo Trap
*Option: Turbomolecular pump selectable
Performace
Ultimate Pressure 7.0 × 10-5Pa or lower
Pump Down Rate 15 minutes (Atm. to 1.3 × 10-3Pa)
Substrate Heater 350℃ (max.)
Utility
Layout Dimensions 5500mm (W) × 7200mm (D) × 3700mm (H) approx.
Power Requirements 3-phase, 200V, 50/60Hz, 120kVA approx.
Cooling Water Flow Rate 180 /min or greater
Compressed Air Pressure 0.5MPa or greater
Gross Weight 10000kg approx
OTFC-1800
Model OTFC-1800CBI/DBI
Vacuum Chamber SUS304, φ1800mm × 1920mm (H)
Substrate Dome Size φ1600mm
Substrate Dome Rotation Speed 10 rpm to 30 rpm (Variable)
Optical Film Thickness Control System HOM2-R-VIS350A High-precision Optical Monitor
· Wavelength range: 350nm to 1100nm
· Reflection/Transmittance
Crystal Film Thickness Monitor XTC/3 plus 6-point rotary sensor
Evaporation Source EB source: 2 units
Ion Source 23 cm RF ion source
Vacuum System Roughing Pump, 2 Diffusion Pumps + Polycold Or 2 Cryo Pumps
*Option: Turbomolecular pump selectable
Performace
Ultimate Pressure 7.0 × 10-5Pa or lower
Pump Down Rate 20 min (Atm. to 1.3 × 10-3Pa)
Substrate Heater 350℃ (max.)
Utility
Layout Dimensions 5700mm (W) × 7700mm (D) × 4000mm (H) approx.
Power Requirements 3-phase, 200V, 50/60Hz, 150kVA approx.
Cooling Water Flow Rate 180 /min or greater
Compressed Air Pressure 0.5MPa or greater
Gross Weight 11200kg approx
Gener-1300
Chamber Size SUS304, φ1300 mm × 1500 mm (H)
Substrate Dome Four-sectional Dome (or φ1200 mm)
Max. Dome Rotation Speed 30 rpm (Variable)
Crystal Film Thickness Monitor XTC/3 plus 6-point rotary sensor
Evaporation Source One unit of EB source
Performace
Ultimate Pressure 7.0 × 10-5 Pa or lower
Pumping Speed 10 min (from atmospheric pressure to 3.0 × 10-3 Pa)
Max. Substrate Heating Temp. 350℃
Utility Requirements
Installation Space 4500 mm (W) × 6000 mm (D) × 3200 mm (H)
Power Source 3-phase, 200 V, 50/60 Hz, 80 kVA, approx.
Minimum Water Flow 100 /min
Air Pressure 0.5 - 0.7 MPa
Weight 6500kg, approx.
Gener-2350
Chamber Size φ2350 mm × H1400 mm
Substrate Dome φ2200 mm, Five-sectional
Max. Dome Rotation Speed 20 rpm
Crystal Film Thickness Monitor 6-point Crystal flim monitor
Evaporation Source One unit of EB source, Movable AS source
Ion Source RF Ion Source
Performace
Ultimate Pressure 7.0E-5 Pa or lower
Pumping Speed 15 min (from atmospheric pressure to 2.0 × 10-3 Pa
Utility Requirements
Installation Space 6300 (W) × 9000 (D) × 4000 mm (H)
Power Source 3-phase, 200 V, 50/60 Hz, 80 kVA, approx.
Minimum Water Flow 220 /min
Air Pressure 0.5 - 0.7 MPa
Weight 12000kg, approx.
Gener-2750
Chamber Size φ2750 mm × H1880 mm
Substrate Dome φ2640 mm, Four-sectional
Max. Dome Rotation Speed 20 rpm
Crystal Film Thickness Monitor 6-point Crystal flim monitor
Evaporation Source 1 unit of EB source, Movable AS source
Ion Source RF Ion Source
Performace
Ultimate Pressure 7.0 × 10-5 Pa or lower
Pumping Speed 15 min (From Atomospheric to 1.3 × 10-3 Pa)
Utility Requirements
Installation Space 7500 (W) × 10000 (D) × 3600 mm (H)
Power Source 3-phase+G, 200 V ± 10%, 150 kVA, 50/60 Hz
Minimum Water Flow 220 /min
Air Pressure 0.5 - 0.7 MPa
Weight 15000 kg, approx.
NSC-15
Vacuum Chamber LL Room: SUS304, W500 mm×D800 mm×H2890 mm
PR Room: SUS304, φ1650 mm × H1200 mm
Substrate Dome Selectable 13 - 22 pcs a holder
Rotary substrate drum system φ1500 mm, Drum Type, 10 rpm - 100 rpm (Variable)
Reaction source ICP (Inductively coupled plasma)
Sputtering source Dual rotary cathode (Planner type as option)
Evacuation system Roughing pump, Turbo molecular pump
Performace
Ultimate Pressure LL chamber: 10 Pa
PR chamber: ≤5.0 × 10-4 Pa
Pump Down Rate LL chamber: ≤20 min (from atmospheric to 1.0 × 10-1 Pa)
PR chamber: ≤40 min (from atmospheric to 5.0 × 10-3 Pa)
Setting substrate heating temperature 150℃ as option
Utility Requirements
Layout Dimensions 5800 mm (W) × 7700 mm (D) × 3200 mm (H)
Power Requirements 3-phase, 380V ± 10%, 130kVA, 50/60Hz
Cooling Water Flow Rate 233 /min or greater
Compressed Air Pressure 0.5 MPa - 0.7 MPa
Gross Weight 16000 kg approx.
NSC-2350
Vacuum Chamber LL Room:SUS304, W700 × H1860 × D1760 mm
UL Room:W700 × H1860 × D1760 mm
TR Room:W660 × H1860 × D1760 mm
Substrate Dome Selectable 15 - 22 pcs
Rotary substrate drum system φ2245 mm, Drum Type, 10 rpm - 50 rpm (Tunable)
Reaction source ICP (Inductively coupled plasma)
Sputtering source Dual Rotary cathode (Planner type as option)
Evacuation system Roughing pump, Turbo molecular pump, Meissner chiller
Performace
Ultimate Pressure LL Room: 10 Pa
PR Room: ≤2.0 × 10-4 Pa
Pump Down Rate LL Room: 8 min (from atmospheric to 10 Pa)
PR Room: 40 min (from atmospheric to 9.0 × 10-4 Pa)
Utility Requirements
Installation Space 7000 mm (W) × 6600 mm (D) × 4000 mm (H)
Electricity 3-phase+G, 380V ± 5%, 300kVA, 50/60Hz
Min. Water Flow Rate 400 /min or greater (Pressure:0.6 - 0.7 Mpa)
Compressed Air Pressure 0.5 MPa - 0.7 MPa
Gross Weight 30000 kg approx.
OWLS-1800
Vacuum Chamber LL Room:W820 mm × H1455 mm × D740 mm
TR Room:W1070 mm × H480 mm × D1070 mm
PR Room:W2540 mm × H745 mm × D2285 mm
Substrate Dome 10 pcs (Max 12 inch)
Rotary substrate drum system φ1800 mm × H48 mm, Turntable type, 10 ~ 100 rpm (Tunable)
Reaction source ICP (Inductively coupled plasma)
Sputtering source Dual rotary cathode (Planner type in option)
Evacuation system Roughing pump, Turbo molecular pump, Meissner chiller
Performace
Ultimate Pressure LL Room, TR Room:10 Pa
PR Room:≤5.0X10-4 Pa
Pump Down Rate LL Room, TR Room:5 min (From atomospheric to 10 Pa)
PR Room:40 min (From atomospheric to 5.0X10-3 Pa)
Utility Requirements
Installation Space 7000 mm (W) × 6600 mm (D) × 4000 mm (H)
Electricity 3-phase+G, 380V ± 5%, 125 kVA, 50/60 Hz
Min. Water Flow Rate 195 /min or greater
Compressed Air Pressure 0.5 - 0.7 MPa
Gross Weight 13500 kg approx.
RPD-1000
Chamber Size 1000 mm × H1165 mm
Substrate Dome φ 870 mm
Max. Dome Rotation Speed 10 - 30 rpm
Crystal Flim Thicness Monitor 6 point rotary sensor
Ion Source Reactive Plasma Source
Performace
Ultimate Pressure 1.0E-4 Pa or lower
Pumping Speed 20 min (from atmospheric pressure to 1.3 × 10-3 Pa)
Utility Requirements
Installation Space 4000 mm (W) × 6000 mm (D) × 2800 mm (H) approx.
Power Source 3-phase, 200 V ± 5%, 75 kVA, approx.
Minimum Water Flow 80 /min or greater
Air Pressure 0.5 MPa - 0.7 MPa
Weight 4000 kg approx.
ALDER-1000
Vacuum Chamber W 900 mm × D 900 mm × H 1150 mm
Chamber Box W 374 mm × D 700 mm × H 800 mm
Rotary Substrate-rack φ350 holder × 40, Max. 30 rpm
Plasma Source ICP (Inductively Coupled Plasma)
Precursor Feeder Precursor bottle, ALD valve, Precursors (TMA, 3DMAS,TiCl4, etc.)
Evacuation System Dry pump
Performace
Ultimate Pressure Vacuum Chamber: < 7 Pa
Pump Down Time Vacuum Chamber:30 min (From atomspheric to 10 Pa)
Coating temperature Max. 130℃
Utility Requirements
Installation Space 4600 mm (W) × 5000 mm (D) × 3000 mm (H)
Electricity 3-phase+N+G, 380 V ± 10%, 50 Hz/60 Hz,80 kVA, approx.
Min. Water Flow Rate ≥ 110 /min
Air Pressure 0.6 - 0.8 MPa
Weight 8400 kg approx.
[A37-0015] GRID MOUNT PLATE
[A37-0016] GRID RETAINER PLATE
[A37-0017] MOUNT RING
[A37-1916] ACC LEAD
[A37-1917] BEAM LEAD
[A37-3003] Coiling Insulator
[A37-3008] Collector 1A
[A37-3047] Fixture plate 1A
[A37-3048] Collector
[A37-3049] POLE
[A37-3051] Coiling Plate-1
[A37-3052] Coiling plate-2
[A37-3054] INSULATOR PLATE
[A37-3057] PLATE-3 WELDING
[A37-3059] STANDOFF POLE
[A37-3062] Coiling
[A37-3063] 14 SUPORT
[A37-3065] Discharge Chamber
[A37-3071] COIL RETAINING BAR
[A37-3072] BRACKET
[A37-3075] Plate-2
[A37-3076] KEEPER
[A37-3076] Plate-1
[A37-3904] KEEPER LEAD 1A
[A37-3905] COLLECTOR LEAD
[A37-3911] RF LEAD
[A37-3912] KEEPER LEAD
[A37-9006] Keeper Insulator
[A37-9033] RFN Insulator
[A37-9338] Insulator3
[C26-0040-0] SKIRT SHAFT
[C37-0042] SIX POINTS HOLDER
[W23-0001] Digital Flow Switch
[W52-1001] Ionization Gauge Sensor Head
[W52-1004] PSG050
[W60-5006] Anode Ring
Blade Mash
이용약관 개인정보처리방침 이메일무단수집거부
Address: Room 812, 120, Daehwa-ro, Daedeok-gu, Daejeon, Republic of Korea TEL : +82 42-933-4244~5
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Copyright ⓒ 2014 4M Electro-Optics Co., Ltd. All rights reserved.

Copyright ⓒ 2014 4M Electro-Optics Co., Ltd. All rights reserved.