4M Electro-Optics tạo nên giá trị doanh nghiệp
OTFC-900 | |
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Model | OTFC-900CBI/DBI |
Vacuum Chamber | SUS304, φ900mm × 1300mm (H) |
Substrate Dome Size | φ790mm |
Substrate Dome Rotation Speed | 10 rpm to 30 rpm (Variable) |
Optical Film Thickness Control System | HOM2-R-VIS350A High-precision Optical Monitor
· Wavelength range: 350nm to 1100nm · Reflection/Transmittance |
Crystal Film Thickness Monitor | XTC/3 plus 6-point rotary sensor |
Evaporation Source | EB source: 2 units |
Ion Source | 10cm RF Ion Source |
Vacuum System | Roughing Pump, Diffusion Pump + Polycold Or Cryo Pump + Cryo Trap |
Performace | |
Ultimate Pressure | 7.0 × 10-5Pa or lower |
Pump Down Rate | 15 min (Atm. to 1.3 × 10-3Pa) |
Substrate Heater | 350℃ (max.) |
Utility | |
Layout Dimensions | 4500mm (W) × 5500mm (D) × 3200mm (H) approx. |
Power Requirements | 3-phase, 200V, 50/60Hz, 80kVA approx. |
Cooling Water Flow Rate | 80 /min or greater |
Compressed Air Pressure | 0.5MPa or greater |
Gross Weight | 5400kg approx. |
OTFC-1300 | |
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Model | OTFC-1300CBI/DBI |
Vacuum Chamber | SUS304, φ1300mm × 1610mm (H) |
Substrate Dome Size | φ1130mm |
Substrate Dome Rotation Speed | 10 rpm to 50 rpm (Variable) |
Optical Film Thickness Control System | HOM2-R-VIS350A High-precision Optical Monitor
· Wavelength range: 350nm to 1100nm · Reflection/Transmittance |
Crystal Film Thickness Monitor | XTC/3 plus 6-point rotary sensor |
Evaporation Source | EB source: 2 units |
Ion Source | 17cm RF Ion Source |
Vacuum System | Roughing Pump, 2 Diffusion Pumps + Polycold Or 2 Cryo Pumps + Cryo Trap
*Option: Turbomolecular pump selectable |
Performace | |
Ultimate Pressure | 7.0 × 10-5Pa or lower |
Pump Down Rate | 15 min (Atm. to 1.3 × 10-3Pa) |
Substrate Heater | 350℃ (max.) |
Utility | |
Layout Dimensions | 5000mm (W) × 6500mm (D) × 3500mm (H) approx. |
Power Requirements | 3-phase, 200V, 50/60Hz, 100kVA approx. |
Cooling Water Flow Rate | 140 /min or greater |
Compressed Air Pressure | 0.5MPa or greater |
Gross Weight | 8500kg approx. |
OTFC-1550 | |
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Model | OTFC-1550CBI/DBI |
Vacuum Chamber | SUS304, φ1550mm × 1800mm (H) |
Substrate Dome Size | φ1400mm |
Substrate Dome Rotation Speed | 10 rpm to 30 rpm (Variable) |
Optical Film Thickness Control System | HOM2-R-VIS350A High-precision Optical Monitor
· Wavelength range: 350nm to 1100nm · Reflection/Transmittance |
Crystal Film Thickness Monitor | XTC/3 plus 6-point rotary sensor |
Evaporation Source | EB source: 2 units |
Ion Source | 17cm RF Ion Source |
Vacuum System | Roughing Pump, 2 Diffusion Pumps + Polycold Or 2 Cryo Pumps + Cryo Trap
*Option: Turbomolecular pump selectable |
Performace | |
Ultimate Pressure | 7.0 × 10-5Pa or lower |
Pump Down Rate | 15 minutes (Atm. to 1.3 × 10-3Pa) |
Substrate Heater | 350℃ (max.) |
Utility | |
Layout Dimensions | 5500mm (W) × 7200mm (D) × 3700mm (H) approx. |
Power Requirements | 3-phase, 200V, 50/60Hz, 120kVA approx. |
Cooling Water Flow Rate | 180 /min or greater |
Compressed Air Pressure | 0.5MPa or greater |
Gross Weight | 10000kg approx |
OTFC-1800 | |
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Model | OTFC-1800CBI/DBI |
Vacuum Chamber | SUS304, φ1800mm × 1920mm (H) |
Substrate Dome Size | φ1600mm |
Substrate Dome Rotation Speed | 10 rpm to 30 rpm (Variable) |
Optical Film Thickness Control System | HOM2-R-VIS350A High-precision Optical Monitor
· Wavelength range: 350nm to 1100nm · Reflection/Transmittance |
Crystal Film Thickness Monitor | XTC/3 plus 6-point rotary sensor |
Evaporation Source | EB source: 2 units |
Ion Source | 23 cm RF ion source |
Vacuum System | Roughing Pump, 2 Diffusion Pumps + Polycold Or 2 Cryo Pumps
*Option: Turbomolecular pump selectable |
Performace | |
Ultimate Pressure | 7.0 × 10-5Pa or lower |
Pump Down Rate | 20 min (Atm. to 1.3 × 10-3Pa) |
Substrate Heater | 350℃ (max.) |
Utility | |
Layout Dimensions | 5700mm (W) × 7700mm (D) × 4000mm (H) approx. |
Power Requirements | 3-phase, 200V, 50/60Hz, 150kVA approx. |
Cooling Water Flow Rate | 180 /min or greater |
Compressed Air Pressure | 0.5MPa or greater |
Gross Weight | 11200kg approx |
Gener-1300 | |
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Chamber Size | SUS304, φ1300 mm × 1500 mm (H) |
Substrate Dome | Four-sectional Dome (or φ1200 mm) |
Max. Dome Rotation Speed | 30 rpm (Variable) |
Crystal Film Thickness Monitor | XTC/3 plus 6-point rotary sensor |
Evaporation Source | One unit of EB source |
Performace | |
Ultimate Pressure | 7.0 × 10-5 Pa or lower |
Pumping Speed | 10 min (from atmospheric pressure to 3.0 × 10-3 Pa) |
Max. Substrate Heating Temp. | 350℃ |
Utility Requirements | |
Installation Space | 4500 mm (W) × 6000 mm (D) × 3200 mm (H) |
Power Source | 3-phase, 200 V, 50/60 Hz, 80 kVA, approx. |
Minimum Water Flow | 100 /min |
Air Pressure | 0.5 - 0.7 MPa |
Weight | 6500kg, approx. |
Gener-2350 | |
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Chamber Size | φ2350 mm × H1400 mm |
Substrate Dome | φ2200 mm, Five-sectional |
Max. Dome Rotation Speed | 20 rpm |
Crystal Film Thickness Monitor | 6-point Crystal flim monitor |
Evaporation Source | One unit of EB source, Movable AS source |
Ion Source | RF Ion Source |
Performace | |
Ultimate Pressure | 7.0E-5 Pa or lower |
Pumping Speed | 15 min (from atmospheric pressure to 2.0 × 10-3 Pa |
Utility Requirements | |
Installation Space | 6300 (W) × 9000 (D) × 4000 mm (H) |
Power Source | 3-phase, 200 V, 50/60 Hz, 80 kVA, approx. |
Minimum Water Flow | 220 /min |
Air Pressure | 0.5 - 0.7 MPa |
Weight | 12000kg, approx. |
Gener-2750 | |
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Chamber Size | φ2750 mm × H1880 mm |
Substrate Dome | φ2640 mm, Four-sectional |
Max. Dome Rotation Speed | 20 rpm |
Crystal Film Thickness Monitor | 6-point Crystal flim monitor |
Evaporation Source | 1 unit of EB source, Movable AS source |
Ion Source | RF Ion Source |
Performace | |
Ultimate Pressure | 7.0 × 10-5 Pa or lower |
Pumping Speed | 15 min (From Atomospheric to 1.3 × 10-3 Pa) |
Utility Requirements | |
Installation Space | 7500 (W) × 10000 (D) × 3600 mm (H) |
Power Source | 3-phase+G, 200 V ± 10%, 150 kVA, 50/60 Hz |
Minimum Water Flow | 220 /min |
Air Pressure | 0.5 - 0.7 MPa |
Weight | 15000 kg, approx. |
NSC-15 | |
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Vacuum Chamber | LL Room: SUS304, W500 mm×D800 mm×H2890 mm PR Room: SUS304, φ1650 mm × H1200 mm |
Substrate Dome | Selectable 13 - 22 pcs a holder |
Rotary substrate drum system | φ1500 mm, Drum Type, 10 rpm - 100 rpm (Variable) |
Reaction source | ICP (Inductively coupled plasma) |
Sputtering source | Dual rotary cathode (Planner type as option) |
Evacuation system | Roughing pump, Turbo molecular pump |
Performace | |
Ultimate Pressure | LL chamber: 10 Pa PR chamber: ≤5.0 × 10-4 Pa |
Pump Down Rate | LL chamber: ≤20 min (from atmospheric to 1.0 × 10-1 Pa) PR chamber: ≤40 min (from atmospheric to 5.0 × 10-3 Pa) |
Setting substrate heating temperature | 150℃ as option |
Utility Requirements | |
Layout Dimensions | 5800 mm (W) × 7700 mm (D) × 3200 mm (H) |
Power Requirements | 3-phase, 380V ± 10%, 130kVA, 50/60Hz |
Cooling Water Flow Rate | 233 /min or greater |
Compressed Air Pressure | 0.5 MPa - 0.7 MPa |
Gross Weight | 16000 kg approx. |
NSC-2350 | |
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Vacuum Chamber | LL Room:SUS304, W700 × H1860 × D1760 mm UL Room:W700 × H1860 × D1760 mm TR Room:W660 × H1860 × D1760 mm |
Substrate Dome | Selectable 15 - 22 pcs |
Rotary substrate drum system | φ2245 mm, Drum Type, 10 rpm - 50 rpm (Tunable) |
Reaction source | ICP (Inductively coupled plasma) |
Sputtering source | Dual Rotary cathode (Planner type as option) |
Evacuation system | Roughing pump, Turbo molecular pump, Meissner chiller |
Performace | |
Ultimate Pressure | LL Room: 10 Pa PR Room: ≤2.0 × 10-4 Pa |
Pump Down Rate | LL Room: 8 min (from atmospheric to 10 Pa) PR Room: 40 min (from atmospheric to 9.0 × 10-4 Pa) |
Utility Requirements | |
Installation Space | 7000 mm (W) × 6600 mm (D) × 4000 mm (H) |
Electricity | 3-phase+G, 380V ± 5%, 300kVA, 50/60Hz |
Min. Water Flow Rate | 400 /min or greater (Pressure:0.6 - 0.7 Mpa) |
Compressed Air Pressure | 0.5 MPa - 0.7 MPa |
Gross Weight | 30000 kg approx. |
OWLS-1800 | |
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Vacuum Chamber | LL Room:W820 mm × H1455 mm × D740 mm TR Room:W1070 mm × H480 mm × D1070 mm PR Room:W2540 mm × H745 mm × D2285 mm |
Substrate Dome | 10 pcs (Max 12 inch) |
Rotary substrate drum system | φ1800 mm × H48 mm, Turntable type, 10 ~ 100 rpm (Tunable) |
Reaction source | ICP (Inductively coupled plasma) |
Sputtering source | Dual rotary cathode (Planner type in option) |
Evacuation system | Roughing pump, Turbo molecular pump, Meissner chiller |
Performace | |
Ultimate Pressure | LL Room, TR Room:10 Pa PR Room:≤5.0X10-4 Pa |
Pump Down Rate | LL Room, TR Room:5 min (From atomospheric to 10 Pa) PR Room:40 min (From atomospheric to 5.0X10-3 Pa) |
Utility Requirements | |
Installation Space | 7000 mm (W) × 6600 mm (D) × 4000 mm (H) |
Electricity | 3-phase+G, 380V ± 5%, 125 kVA, 50/60 Hz |
Min. Water Flow Rate | 195 /min or greater |
Compressed Air Pressure | 0.5 - 0.7 MPa |
Gross Weight | 13500 kg approx. |
RPD-1000 | |
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Chamber Size | 1000 mm × H1165 mm |
Substrate Dome | φ 870 mm |
Max. Dome Rotation Speed | 10 - 30 rpm |
Crystal Flim Thicness Monitor | 6 point rotary sensor |
Ion Source | Reactive Plasma Source |
Performace | |
Ultimate Pressure | 1.0E-4 Pa or lower |
Pumping Speed | 20 min (from atmospheric pressure to 1.3 × 10-3 Pa) |
Utility Requirements | |
Installation Space | 4000 mm (W) × 6000 mm (D) × 2800 mm (H) approx. |
Power Source | 3-phase, 200 V ± 5%, 75 kVA, approx. |
Minimum Water Flow | 80 /min or greater |
Air Pressure | 0.5 MPa - 0.7 MPa |
Weight | 4000 kg approx. |
ALDER-1000 | |
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Vacuum Chamber | W 900 mm × D 900 mm × H 1150 mm |
Chamber Box | W 374 mm × D 700 mm × H 800 mm |
Rotary Substrate-rack | φ350 holder × 40, Max. 30 rpm |
Plasma Source | ICP (Inductively Coupled Plasma) |
Precursor Feeder | Precursor bottle, ALD valve, Precursors (TMA, 3DMAS,TiCl4, etc.) |
Evacuation System | Dry pump |
Performace | |
Ultimate Pressure | Vacuum Chamber: < 7 Pa |
Pump Down Time | Vacuum Chamber:30 min (From atomspheric to 10 Pa) |
Coating temperature | Max. 130℃ |
Utility Requirements | |
Installation Space | 4600 mm (W) × 5000 mm (D) × 3000 mm (H) |
Electricity | 3-phase+N+G, 380 V ± 10%, 50 Hz/60 Hz,80 kVA, approx. |
Min. Water Flow Rate | ≥ 110 /min |
Air Pressure | 0.6 - 0.8 MPa |
Weight | 8400 kg approx. |
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