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HOME > 제품소개ComponentsRF ION SOURCE > OIS-GL

OIS-GL

Application

OIS-GL 관련 이미지

OIS-GL is low voltage, high current gridless ion source, and has beendeveloped for substrate cleaning, ion assisted deposition, etc. Variousoptical filters can be produced by installing it in Gener-1300 or theOTFC series.

FEATURES

  • Well-suited to substrate cleaning and resin substrate coating.
  • Wide beam angle at low energy and high current, designed forlarge area over φ1200.
  • High operational stability by improving the cooling method.

Specifications

Specifications of OIS-GL
Size φ163mm×200mm(H)
Discharge voltage 50V - 300V
Discharging current (max) 8A
Gas flow rate 8sccm~50sccm(argon)
12sccm~100sccm(oxygen)
Pressure 3.5×10-2Pa or lower
Water-cooling Anode and beam unit
Neutralizer Tungsten (W) filament

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