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HOME > 제품소개ComponentsRF ION SOURCE > Electron Source

Electron Source

Application

Its high current density is remarkably effective at increasing plasmadensity and preventing the plasma process from charge-up. Longtime stability and less contamination in the oxygen process achievedby RF excitation. Two sources can be controlled simultaneously.

Specifications

Specifications of Electron Source
Neutralizer RFN-3A
Emission 3000mA
Max RF Power 150W(max)
Controller OIS-ESC
Neutralizer DC OISN-Ⅱ
Neutralizer RF AX300Ⅲ(300W)

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