본문바로가기
메뉴바로가기

 비주얼 이미지

제품소개

  • Optical Crystals
  • R&D Machine
  • Control Frame & Programming
  • Thin Film Coaters
  • Components

HOME > 제품소개ComponentsRF ION SOURCE > OIS-Three/OIS-Three Plus

OIS-Three/OIS-Three Plus

Application

OIS-Three/OIS-Three Plus 관련 이미지

OIS-Three/OIS-Three Plus has an incomparable high power beam toany other ion beam assisted deposition systems. Uniform irradiationcovers an entire dome with 1600 in diameter. OIS-Three/OIS-ThreePlus is most suitable for mass production of sophisticated opticalfilters when equipped with OTFC-1800.

FEATURES

  • Newly developed grid has long life.
  • Long life and less contamination.
  • Higher uniformity of ion density with a wide coverage over adome with 1600mm in diameter.
  • Great stability and non-stop operation for longer hours.

Specifications

ModelOIS-ThreeOIS-Three Plus
Dimensions φ390mm×215mm(H)
Grids φ 23cm three molybdenum grids
Beam voltage 100V~1500V
Max beam current 1800mA 2400mA
Acc voltage 100V~1000V
Max RF power 2000W
Gas flow rate 20sccm~40sccm(argon)
40sccm~80sccm(oxygen)
Pressure 5×10-2Pa
Water-cooling RF coil and beam unit
Neutralizer
Dimensions φ7cm×12cm
Max emission current 2800mA 3000mA
Max RF power 150W(max)
Gas flow rate 5sccm~10sccm(argon only)

OIS-Three/OIS-Three Plus 관련 이미지

뒤로가기

E카달로그

견적의뢰 AS신청

TOP