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HOME > 제품소개ComponentsRF ION SOURCE > OIS-Two/OIS-Two Plus

OIS-Two/OIS-Two Plus

Application

OIS-Two/OIS-Two Plus 관련 이미지

Optorun OIS-Two RF ion sources are developed for high-rate andwide-area ion-assisted deposition and substrate ion cleaning, whichare installed in Optorun OTFC-1300 and OTFC-1550 coaters formass production of various optical filters.

FEATURES

  • Original grid designed for longer life.
  • Filamentless design. Less contamination and long life.
  • High and uniform current beams with broad beam angle.
  • Stable operation for long time.

Specifications

ModelOIS-TwoOIS-Two Plus
Dimensions φ300mm×150mm(H)
Grids φ 17cm three molybdenum grids
Beam voltage 100V~1500V
Max beam current 1200mA(max)
Acc voltage 100V~1000V
Max RF power 750W 1000W
Gas flow rate 20sccm~30sccm(argon)
40sccm~60sccm(oxygen)
Pressure 5×10-2Pa
Water-cooling RF coil and beam unit
Neutralizer
Dimensions φ7cm×12cm φ7cm×12cm
Max emission current 2000mA 2400mA
Max RF power 150W
Gas flow rate 5sccm~10sccm(argon only)

OIS-Two/OIS-Two Plus 관련 이미지

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